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mask aligner

  • nano imprint kit
  • nano imprint kit
  • nano imprint kit
nano imprint kit nano imprint kit nano imprint kit

nano imprint kit-吉祥棋牌官方正版

  • product description: nano imprint kit

nano imprint kit
ezimprinting’s equipment consists of a nanoimprint module and a controller module. by simply retrofitting your conventional optical mask aligner, our solution can upgrade any facility’s traditional photolithography capacity. ezimprinting provides semiautomatic nanoimprinting with precision nanoscale alignment capabilities. simple, straight-forward steps direct users through the entire imprint procedure.


spec

  • substrate size: 4 inch
  • imprintable wafer area: 4 inch maximum
  • mold substrate size: 5 x 0.09 inch
  • typical imprint throughput :< 5 min./wafer
  • imprint pressure:0 - 25 psi


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