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ultra vacuum products

  • rie

refractive ion etching system-吉祥棋牌官方正版

  • refractive ion etching system
  • product description: refractive ion etching system


an rie is a type of plasma source in which the energy is supplied by electrical currents produced by electromagnetic induction; that is, by time-varying magnetic fields. in its simplest form, an inductively coupled plasma consists of avacuum vessel, into which the gas to be ionized is administered, and an induction coil,driven by a source of rf power. the coil is generally separated from the vacuum regionby a dielectric window. the wide range of applications for rf-driven, inductively coupled plasma sources has recently expanded into processing tools for coating or etching systems in the microelectronics industry.

system configuration:  r&d
substrate size :  2” - 6” (50.8mm - 150mm)
etch uniformity :  1.06±% within 3” wafer
etch rate :  1.16µm/min
process chamber :   al anodized chamber
substrate :    he backside cooling / bias / chiller (-20℃ ~ 50℃)
source :   icp source with plasma spiral coil
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