refractive ion etching system-吉祥棋牌官方正版

rie

an rie is a type of plasma source in which the energy is supplied by electrical currents produced by electromagnetic induction; that is, by time-varying magnetic fields. in its simplest form, an inductively coupled plasma consists of avacuum vessel, into which the gas to be ionized is administered, and an induction coil,driven by a source of rf power. the coil is generally separated from the vacuum regionby a dielectric window. the wide range of applications for rf-driven, inductively coupled plasma sources has recently expanded into processing tools for coating or etching systems in the microelectronics industry.