moke system-吉祥棋牌官方正版

moke systems

uhv system for the in-situ real time magneto-optical kerr effect studies of ultra-thin magnetic films and multilayers with film deposition by e-beam evaporation.

• base pressure range 10-10 mbar after bakeout at 150 °c
• magnetic poles arranged perpendicularly to the sample
• field beetwen magnetic poles > 0,17 tesla
• 4-axes uhv sample manipulator for flag sample holders
• sample heating up to 800 °c & cooling with ln2
• optical system for moke chamber (modulator, polaryzers, photodetector, laser)
• whole chamber with equipment is mounted on the positioning stage
• vacuum suitcase for sample easy transport